DC Field | Value | Language |
---|---|---|
dc.contributor.author | HWANG, CS | ko |
dc.contributor.author | PARK, SO | ko |
dc.contributor.author | KANG, CS | ko |
dc.contributor.author | CHO, HJ | ko |
dc.contributor.author | KANG, HK | ko |
dc.contributor.author | AHN, ST | ko |
dc.contributor.author | LEE, MY | ko |
dc.date.accessioned | 2016-11-30T01:48:15Z | - |
dc.date.available | 2016-11-30T01:48:15Z | - |
dc.date.created | 2016-11-10 | - |
dc.date.created | 2016-11-10 | - |
dc.date.issued | 1995-09 | - |
dc.identifier.citation | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.34, no.9B , pp.5178 - 5183 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | http://hdl.handle.net/10203/214179 | - |
dc.description.abstract | SrTiO3 thin films are deposited on Pt/SiO2/Si substrates using RF magnetron sputtering in a temperature range from 200 degrees C to 600 degrees C. The film deposited at 600 degrees C shows the best dielectric property and leakage current characteristics due to its good crystallinity and stoichiometric composition. Dielectric constant of the film deposited at 600 degrees C decreases with decreasing thickness from 235 at 120 nm to 145 at 30 nm. Leakage current shows a constant value of about 30 nA/cm(2) at 1.6 V in a thickness range from 50 nm to 120 nm but increases rapidly to 5 mu A/cm(2) at 30 nm. The electrical properties of the films are explained by a model of thr Pt/SrTiO3/Pt capacitor based on the band structure. | - |
dc.language | English | - |
dc.publisher | JAPAN J APPLIED PHYSICS | - |
dc.title | DEPOSITION AND ELECTRICAL CHARACTERIZATION OF VERY THIN SRTIO3 FILMS FOR ULTRA LARGE-SCALE INTEGRATED DYNAMIC RANDOM-ACCESS MEMORY APPLICATION | - |
dc.type | Article | - |
dc.identifier.wosid | A1995TF80400023 | - |
dc.identifier.scopusid | 2-s2.0-0029370272 | - |
dc.type.rims | ART | - |
dc.citation.volume | 34 | - |
dc.citation.issue | 9B | - |
dc.citation.beginningpage | 5178 | - |
dc.citation.endingpage | 5183 | - |
dc.citation.publicationname | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | - |
dc.identifier.doi | 10.1143/JJAP.34.5178 | - |
dc.contributor.localauthor | AHN, ST | - |
dc.contributor.nonIdAuthor | HWANG, CS | - |
dc.contributor.nonIdAuthor | PARK, SO | - |
dc.contributor.nonIdAuthor | KANG, CS | - |
dc.contributor.nonIdAuthor | CHO, HJ | - |
dc.contributor.nonIdAuthor | KANG, HK | - |
dc.contributor.nonIdAuthor | LEE, MY | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | THIN FILMS | - |
dc.subject.keywordAuthor | SRTIO3 | - |
dc.subject.keywordAuthor | SPUTTERING | - |
dc.subject.keywordAuthor | DEPLETION LAYER | - |
dc.subject.keywordAuthor | LEAKAGE CURRENT | - |
dc.subject.keywordAuthor | CAPACITANCE | - |
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