DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jong Min | ko |
dc.contributor.author | Hur, Yoon Hyung | ko |
dc.contributor.author | Jeong, Jae Won | ko |
dc.contributor.author | Nam, Tae Won | ko |
dc.contributor.author | Lee, Jung Hye | ko |
dc.contributor.author | Jeon, Kiung | ko |
dc.contributor.author | Kim, YongJoo | ko |
dc.contributor.author | Jung, Yeon Sik | ko |
dc.date.accessioned | 2016-10-04T07:20:07Z | - |
dc.date.available | 2016-10-04T07:20:07Z | - |
dc.date.created | 2016-09-21 | - |
dc.date.created | 2016-09-21 | - |
dc.date.issued | 2016-08 | - |
dc.identifier.citation | CHEMISTRY OF MATERIALS, v.28, no.16, pp.5680 - 5688 | - |
dc.identifier.issn | 0897-4756 | - |
dc.identifier.uri | http://hdl.handle.net/10203/213079 | - |
dc.description.abstract | Directed self-assembly (DSA) of block copolymers (BCPs) with a high Flory Huggins interaction parameter (chi) provides advantages of pattern size reduction below 10 nm and improved pattern quality. Despite theoretical predictions, however, the questions of whether BCPs with a much higher chi than conventional high-chi BCPs can further improve the line edge roughness (LER) and how to overcome their extremely slow self-assembly kinetics remain unanswered. Here, we report the synthesis and assembly of poly(4vinylpyridine-b-dimethylsiloxane) BCP with an extremely high chi-parameter (estimated to be approximately 7 times higher compared to that of poly(styrene-b-dimethylsiloxane) - a conventional high-chi BCP) and achieve a markedly low 3 sigma line edge roughness of 0.98 nm, corresponding to 6% of its line width. Moreover, we demonstrate the successful application of an ethanol based 60 degrees C warm solvent annealing treatment to address the extremely slow assembly kinetics of the extremely high-chi BCP, considerably reducing the self-assembly time from several hours to a few minutes. This study suggests that the use of BCPs with an even larger chi could be beneficial for further improvement of self-assembled BCP pattern quality | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | THIN-FILMS | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | SOLVENT | - |
dc.subject | POLYMER | - |
dc.subject | RESOLUTION | - |
dc.subject | ROUGHNESS | - |
dc.subject | DOMAINS | - |
dc.subject | NANOLITHOGRAPHY | - |
dc.subject | NANOSTRUCTURES | - |
dc.subject | GRAPHOEPITAXY | - |
dc.title | Block Copolymer with an Extremely High Block-to-Block Interaction for a Significant Reduction of Line-Edge Fluctuations in Self Assembled Patterns | - |
dc.type | Article | - |
dc.identifier.wosid | 000381960300016 | - |
dc.identifier.scopusid | 2-s2.0-84983677580 | - |
dc.type.rims | ART | - |
dc.citation.volume | 28 | - |
dc.citation.issue | 16 | - |
dc.citation.beginningpage | 5680 | - |
dc.citation.endingpage | 5688 | - |
dc.citation.publicationname | CHEMISTRY OF MATERIALS | - |
dc.identifier.doi | 10.1021/acs.chemmater.6b01731 | - |
dc.contributor.localauthor | Jung, Yeon Sik | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | SOLVENT | - |
dc.subject.keywordPlus | POLYMER | - |
dc.subject.keywordPlus | RESOLUTION | - |
dc.subject.keywordPlus | ROUGHNESS | - |
dc.subject.keywordPlus | DOMAINS | - |
dc.subject.keywordPlus | NANOLITHOGRAPHY | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.subject.keywordPlus | GRAPHOEPITAXY | - |
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