DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Bong-Hoon | ko |
dc.contributor.author | Kim, Ju-Young | ko |
dc.contributor.author | Jeong, Seong-Jun | ko |
dc.contributor.author | Hwang, Jin-Ok | ko |
dc.contributor.author | Lee, Duck-Hyun | ko |
dc.contributor.author | Shin, Dong-Ok | ko |
dc.contributor.author | Choi, Sung-Yool | ko |
dc.contributor.author | Kim, Sang-Ouk | ko |
dc.date.accessioned | 2010-12-23T03:02:46Z | - |
dc.date.available | 2010-12-23T03:02:46Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2010-09 | - |
dc.identifier.citation | ACS NANO, v.4, no.9, pp.5464 - 5470 | - |
dc.identifier.issn | 1936-0851 | - |
dc.identifier.uri | http://hdl.handle.net/10203/21202 | - |
dc.description.abstract | We demonstrate a surface energy modification method exploiting graphene film, Spin-cast, atomic layer thick, large-area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently reduced graphene served as a neutral surface modifier to induce surface perpendicular lamellae or cylinders in a block copolymer nanotemplate. Our approach integrating large-area graphene film preparation with block copolymer lithography is potentially advantageous in creating semiconducting graphene nanoribbons and nanoporous graphene. | - |
dc.description.sponsorship | This work was supported by the National Research Laboratory Program (R0A-2008-000-20057-0), the National Research Foundation of Korea (NRF) (Grant Nos. K20722000002-10B0100-00210, 2008-0062204, 2009-0093758), the Pioneer Research Center Program (2009-0093758), and the basic research program of ETRI (10ZE1160), funded by the Korean government (MEST & MKE). | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | AMER CHEMICAL SOC | - |
dc.title | Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000282121000063 | - |
dc.identifier.scopusid | 2-s2.0-77957303129 | - |
dc.type.rims | ART | - |
dc.citation.volume | 4 | - |
dc.citation.issue | 9 | - |
dc.citation.beginningpage | 5464 | - |
dc.citation.endingpage | 5470 | - |
dc.citation.publicationname | ACS NANO | - |
dc.identifier.doi | 10.1021/nn101491g | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Choi, Sung-Yool | - |
dc.contributor.localauthor | Kim, Sang-Ouk | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | block copolymer | - |
dc.subject.keywordAuthor | self-assembly | - |
dc.subject.keywordAuthor | graphene | - |
dc.subject.keywordAuthor | nanolithography | - |
dc.subject.keywordAuthor | surface energy modification | - |
dc.subject.keywordPlus | GRAPHITE OXIDE | - |
dc.subject.keywordPlus | CARBON NANOTUBES | - |
dc.subject.keywordPlus | SEMICONDUCTORS | - |
dc.subject.keywordPlus | NANOSTRUCTURE | - |
dc.subject.keywordPlus | CONFINEMENT | - |
dc.subject.keywordPlus | REDUCTION | - |
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