DC Field | Value | Language |
---|---|---|
dc.contributor.author | Hwang, S | ko |
dc.contributor.author | Oh, I | ko |
dc.contributor.author | Kwak, Juhyoun | ko |
dc.date.accessioned | 2010-12-07T08:08:07Z | - |
dc.date.available | 2010-12-07T08:08:07Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001-07 | - |
dc.identifier.citation | JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, v.123, no.29, pp.7176 - 7177 | - |
dc.identifier.issn | 0002-7863 | - |
dc.identifier.uri | http://hdl.handle.net/10203/20802 | - |
dc.description.sponsorship | This work was supported in part by the Brain Korea 21 Project in 2000 and by the Korea Science and Engineering Foundation through the MICROS center at KAIST, Korea. | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | UNDERPOTENTIAL DEPOSITION | - |
dc.subject | COPPER DEPOSITION | - |
dc.subject | PB | - |
dc.subject | PHASE | - |
dc.subject | LEAD | - |
dc.title | Electrodeposition of epitaxial Cu(111) thin films on Au(111) using defect-mediated growth | - |
dc.type | Article | - |
dc.identifier.wosid | 000169978900032 | - |
dc.identifier.scopusid | 2-s2.0-0034822715 | - |
dc.type.rims | ART | - |
dc.citation.volume | 123 | - |
dc.citation.issue | 29 | - |
dc.citation.beginningpage | 7176 | - |
dc.citation.endingpage | 7177 | - |
dc.citation.publicationname | JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kwak, Juhyoun | - |
dc.contributor.nonIdAuthor | Hwang, S | - |
dc.contributor.nonIdAuthor | Oh, I | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | UNDERPOTENTIAL DEPOSITION | - |
dc.subject.keywordPlus | COPPER DEPOSITION | - |
dc.subject.keywordPlus | PB | - |
dc.subject.keywordPlus | PHASE | - |
dc.subject.keywordPlus | LEAD | - |
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