Selective sub-10 nm etching of SiO2 layer by carbothermal reduction using single walled carbon nanotubes
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Byon, Hye Ryung | ko |
| dc.contributor.author | Choi, Hee Cheul | ko |
| dc.date.accessioned | 2016-05-12T03:10:14Z | - |
| dc.date.available | 2016-05-12T03:10:14Z | - |
| dc.date.created | 2016-02-17 | - |
| dc.date.created | 2016-02-17 | - |
| dc.date.issued | 2007-03 | - |
| dc.identifier.citation | ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, v.233, pp.478 - 478 | - |
| dc.identifier.issn | 0065-7727 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/207266 | - |
| dc.language | English | - |
| dc.publisher | AMER CHEMICAL SOC | - |
| dc.title | Selective sub-10 nm etching of SiO2 layer by carbothermal reduction using single walled carbon nanotubes | - |
| dc.type | Article | - |
| dc.identifier.wosid | 000207722805466 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 233 | - |
| dc.citation.beginningpage | 478 | - |
| dc.citation.endingpage | 478 | - |
| dc.citation.publicationname | ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | - |
| dc.contributor.localauthor | Byon, Hye Ryung | - |
| dc.contributor.nonIdAuthor | Choi, Hee Cheul | - |
| dc.type.journalArticle | Meeting Abstract | - |
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