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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement

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dc.contributor.authorJeong, Seong-Junko
dc.contributor.authorKim, Ji-Eunko
dc.contributor.authorMoon, Hyoung-Seokko
dc.contributor.authorKim, Bong-Hoonko
dc.contributor.authorKim, Su-Minko
dc.contributor.authorKim, Jin-Baekko
dc.contributor.authorKim, Sang-Oukko
dc.date.accessioned2010-12-01T05:48:52Z-
dc.date.available2010-12-01T05:48:52Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2009-06-
dc.identifier.citationNANO LETTERS, v.9, no.6, pp.2300 - 2305-
dc.identifier.issn1530-6984-
dc.identifier.urihttp://hdl.handle.net/10203/20586-
dc.description.abstractWe demonstrate soft graphoepitaxy of block copolymer assembly as a facile, scalable nanolithography for highly ordered sub-30-nm scale features. Various morphologies of hierarchical block copolymer assembly were achieved by means of disposable topographic confinement of photoresist pattern. Unlike usual graphoepitaxy, soft graphoepitaxy generates the functional nanostructures; of metal and semiconductor nanowire arrays without any trace of structure-directing topographic pattern. Our novel approach is potentially advantageous for multilayer overlay processing required for complex device architectures.-
dc.description.sponsorshipWe thank Dr. C. M. Koo for helpful discussions and Ji Young Park and Ju Young Kim for supporting photoreist patterning and Sung Soon Bae for assisting in SEM analysis. This work was supported by the second stage of the Brain Korea 21 Project, the National Research Laboratory Program (R0A-2008-000-20057-0), KAIST EEWS (Energy, Environment, Water, and Sustainability) Initiative (EEWS0903), the Korea Science and Engineering Foundatin (KOSEF) grant (R11-2008-058- 03002-0), and the Fundamental R&D Program for Core Technology of Materials funded by the Korean government (MEST & MKE).en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherAMER CHEMICAL SOC-
dc.subjectLITHOGRAPHY-
dc.subjectFILMS-
dc.subjectNANOSTRUCTURE-
dc.subjectARRAYS-
dc.subjectALIGNMENT-
dc.subjectPOLYMERS-
dc.subjectPATTERNS-
dc.subjectSURFACES-
dc.subjectMETALS-
dc.titleSoft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement-
dc.typeArticle-
dc.identifier.wosid000266969400019-
dc.identifier.scopusid2-s2.0-66749176700-
dc.type.rimsART-
dc.citation.volume9-
dc.citation.issue6-
dc.citation.beginningpage2300-
dc.citation.endingpage2305-
dc.citation.publicationnameNANO LETTERS-
dc.identifier.doi10.1021/nl9004833-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.localauthorKim, Sang-Ouk-
dc.contributor.nonIdAuthorKim, Su-Min-
dc.type.journalArticleArticle-
dc.subject.keywordPlusLITHOGRAPHY-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusNANOSTRUCTURE-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusALIGNMENT-
dc.subject.keywordPlusPOLYMERS-
dc.subject.keywordPlusPATTERNS-
dc.subject.keywordPlusSURFACES-
dc.subject.keywordPlusMETALS-
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