Charge dependence of nano-particle growth in silane plasmas under UV irradiation

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dc.contributor.authorSeon, Chang-Raeko
dc.contributor.authorChoe, Won-Hoko
dc.contributor.authorChai, Kil-Byoungko
dc.contributor.authorPark, Ho-Yongko
dc.contributor.authorPark, S.ko
dc.date.accessioned2010-11-30T09:22:38Z-
dc.date.available2010-11-30T09:22:38Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2009-01-
dc.identifier.citationNEW JOURNAL OF PHYSICS, v.11-
dc.identifier.issn1367-2630-
dc.identifier.urihttp://hdl.handle.net/10203/20559-
dc.description.abstractThe controlled generation of nano-particles has been an important issue for the nano-structure formation in processing plasmas. We observed that the particle growth under UV irradiation was enhanced due to electric charge reduction of the particles, suggesting that the variation of particle charges could be a control parameter for the particle growth. The particle growth variation by UV irradiation is well described by the particle coagulation model with time-dependent particle charges in consideration, where predator particles grow by adsorbing a few nanometer-sized proto-particles.-
dc.description.sponsorshipThis work was supported by the Korea Research Foundation grant funded by the Korean Government (KRF-2008-314-C00085).en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherIOP PUBLISHING LTD-
dc.subjectDISCHARGE-
dc.titleCharge dependence of nano-particle growth in silane plasmas under UV irradiation-
dc.typeArticle-
dc.identifier.wosid000262258900015-
dc.identifier.scopusid2-s2.0-60849092568-
dc.type.rimsART-
dc.citation.volume11-
dc.citation.publicationnameNEW JOURNAL OF PHYSICS-
dc.identifier.doi10.1088/1367-2630/11/1/013015-
dc.contributor.localauthorChoe, Won-Ho-
dc.contributor.nonIdAuthorPark, S.-
dc.type.journalArticleArticle-
dc.subject.keywordPlusDISCHARGE-
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