DC Field | Value | Language |
---|---|---|
dc.contributor.author | 임태우 | ko |
dc.contributor.author | 박상후 | ko |
dc.contributor.author | 양동열 | ko |
dc.date.accessioned | 2016-04-20T06:36:44Z | - |
dc.date.available | 2016-04-20T06:36:44Z | - |
dc.date.created | 2015-12-16 | - |
dc.date.created | 2015-12-16 | - |
dc.date.issued | 2007-01 | - |
dc.identifier.citation | 한국정밀공학회지, v.24, no.1, pp.64 - 70 | - |
dc.identifier.issn | 1225-9071 | - |
dc.identifier.uri | http://hdl.handle.net/10203/205471 | - |
dc.language | Korean | - |
dc.publisher | 한국정밀공학회 | - |
dc.title | 긴 레이저 조사방식에 의한 저밀도 이광자 광중합 영역을 이용한 Sub-100 nm 정밀도의 엠보싱 패턴제작 | - |
dc.title.alternative | Fabrication of Sub-100 nm Embossing Patterns using Weakly-Polymerized Region via Long-Exposure Technique (LET) in two-Photon Polymerization | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 24 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 64 | - |
dc.citation.endingpage | 70 | - |
dc.citation.publicationname | 한국정밀공학회지 | - |
dc.identifier.kciid | ART001042901 | - |
dc.contributor.localauthor | 양동열 | - |
dc.contributor.nonIdAuthor | 임태우 | - |
dc.contributor.nonIdAuthor | 박상후 | - |
dc.subject.keywordAuthor | Weakly-Polymerized Region (저밀도 광중합 영역) | - |
dc.subject.keywordAuthor | Two-Photon Absorbed Polymerization (이광자 흡수 고화) | - |
dc.subject.keywordAuthor | Femtosecond Laser (펨토초 레이저) | - |
dc.subject.keywordAuthor | Long-Exposure Technique (긴 조사방식) | - |
dc.subject.keywordAuthor | Weakly-Polymerized Region (저밀도 광중합 영역) | - |
dc.subject.keywordAuthor | Two-Photon Absorbed Polymerization (이광자 흡수 고화) | - |
dc.subject.keywordAuthor | Femtosecond Laser (펨토초 레이저) | - |
dc.subject.keywordAuthor | Long-Exposure Technique (긴 조사방식) | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.