Physical design and mask optimization for directed self-assembly lithography (DSAL)
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shim, Seong Bo | ko |
| dc.contributor.author | Shin, Young Soo | ko |
| dc.date.accessioned | 2016-04-18T04:58:03Z | - |
| dc.date.available | 2016-04-18T04:58:03Z | - |
| dc.date.created | 2015-11-23 | - |
| dc.date.created | 2015-11-23 | - |
| dc.date.issued | 2015-10-06 | - |
| dc.identifier.citation | IFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC) , pp.80 - 85 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/204315 | - |
| dc.language | English | - |
| dc.publisher | IEEE, IFIP | - |
| dc.title | Physical design and mask optimization for directed self-assembly lithography (DSAL) | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000382398500016 | - |
| dc.identifier.scopusid | 2-s2.0-84960077058 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 80 | - |
| dc.citation.endingpage | 85 | - |
| dc.citation.publicationname | IFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC) | - |
| dc.identifier.conferencecountry | KO | - |
| dc.identifier.conferencelocation | Daejeon Convention Center | - |
| dc.contributor.localauthor | Shin, Young Soo | - |
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