DC Field | Value | Language |
---|---|---|
dc.contributor.author | Song, Young Soo | ko |
dc.contributor.author | Lee, Jee Myung | ko |
dc.contributor.author | Shin, Young Soo | ko |
dc.date.accessioned | 2016-04-18T04:40:17Z | - |
dc.date.available | 2016-04-18T04:40:17Z | - |
dc.date.created | 2015-11-23 | - |
dc.date.created | 2015-11-23 | - |
dc.date.issued | 2016-02-24 | - |
dc.identifier.citation | SPIE Advanced Lithography | - |
dc.identifier.uri | http://hdl.handle.net/10203/204125 | - |
dc.language | English | - |
dc.publisher | SPIE | - |
dc.title | Integrated routing and fill for self-aligned double patterning (SADP) using grid-based design | - |
dc.type | Conference | - |
dc.identifier.wosid | 000382889100004 | - |
dc.identifier.scopusid | 2-s2.0-84981297860 | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | SPIE Advanced Lithography | - |
dc.identifier.conferencecountry | US | - |
dc.identifier.conferencelocation | San Jose Marriott and San Jose Convention Center | - |
dc.contributor.localauthor | Shin, Young Soo | - |
dc.contributor.nonIdAuthor | Lee, Jee Myung | - |
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