Search
Results 731-740 of 763 (Search time: 0.006 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Regularity for certain degenerate elliptic double obstacle problems Choe, Hi Jun, JOURNAL OF MATHEMATICAL ANALYSIS AND APPLICATIONS, v.169, no.1, pp.111 - 126, 1992 | |
| A FLOW EQUATION AND ITS APPLICATION TO THE AUSTENITIC HIGH MANGANESE STEELS LIM, CY; Kim, Young-Gil, MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, v.141, no.1, pp.67 - 72, 1991-07 | |
| SEISMIC RESPONSE OF SUPPORT-ISOLATED SECONDARY STRUCTURES IN A MULTISTORY STRUCTURE KIM, YS; Lee, DongGeun, ENGINEERING STRUCTURES, v.15, no.5, pp.335 - 347, 1993-09 | |
| Interior behaviour of minimizers for certain functionals with nonstandard growth Choe, Hi Jun, NONLINEAR ANALYSIS-THEORY METHODS & APPLICATIONS, v.19, no.10, pp.933 - 945, 1992-11 | |
| Analytical Delay-Time Modeling of BICMOS Buffers H.D.Lee; I.S.Jho; C.H.Han, 전자공학회논문지 B, v.30, no.1, 1993-01 | |
| LEAKAGE MECHANISMS IN THE HEAVILY DOPED GATED DIODE STRUCTURES Han, Chul-Hi; K.Kim, IEEE ELECTRON DEVICE LETTERS, v.12, no.2, pp.74 - 76, 1991-02 | |
| 제6차 교육과정의 개정에서 과학고등학교의 수학III의 위치 최영한, 수학교육, v.31, no.3, pp.117 - 133, 1992 | |
| Modeling Oxide Thickness Dependence of Charging Damage by Plasma Processing H. Shin; K. Noguchi; C. Hu, IEEE ELECTRON DEVICE LETTERS, v.14, no.11, pp.509 - 511, 1993-11 | |
| A NOVEL LOCAL OXIDATION OF SILICON (LOCOS)-TYPE ISOLATION TECHNOLOGY FREE OF THE FIELD OXIDE THINNING EFFECT PARK, TS; AHN, SJ; AHN, ST, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.33, no.1B, pp.435 - 439, 1994-01 | |
| REDUCTION OF LATERAL PHOSPHORUS DIFFUSION IN CMOS NORMAL-WELLS Ahn, SungTae; KENNEL, HW; PLUMMER, JD; TILLER, WA, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.37, no.3, pp.806 - 807, 1990-03 |
Discover
Type
- 763 Article