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NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
A study on the plasma parameters and characteristics of carbon-doped silicon-oxide films by using MTMS/O-2 and He plasmas

Kang M.S.; Yang C.S.; Choi C.K.; Jung W.B., JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.48, no.6, pp.1702 - 1707, 2006

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