Showing results 1 to 5 of 5
Commensurability-Driven Orientation Control during Block Copolymer Directed Self-Assembly Yun, Hyun Su; Do, Hyung Wan; Berggren, Karl K.; Ross, Caroline A.; Choi, Hong Kyoon, ACS APPLIED MATERIALS & INTERFACES, v.12, no.9, pp.10852 - 10857, 2020-03 |
Controlled/living radical polymerization of vinylcyclicsilazane by RAFT process and their block copolymers Nghiem Q.D.; Nguyen C.T.; Kim D.-P., JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.46, no.13, pp.4594 - 4601, 2008 |
Magnetic nanodot arrays patterned by selective ion etching using block copolymer templates Choi, DG; Jeong, JR; Kwon, KY; Jung, HeeTae; Shin, Sung-Chul; Yang, SM, NANOTECHNOLOGY, v.15, pp.970 - 974, 2004-08 |
Nanoscale patterning and electronics on flexible substrate by direct nanoimprinting of metallic nanoparticles Park, Inkyu; Ko, Seung Hwan; Pan, Heng; Grigoropoulos, Costas P.; Pisano, Albert P.; Frechet, Jean M. J.; Lee, Eting-Sug; et al, ADVANCED MATERIALS, v.20, no.3, pp.489 - 489, 2008-02 |
THE EFFECTS OF X-RAY IRRADIATION-INDUCED DAMAGE ON RELIABILITY IN MOS STRUCTURES KIM, S; LEE, H; HAN, CH; Lee, Kwyro; CHOI, S; JEON, Y; DIFABRIZIO, E; et al, SOLID-STATE ELECTRONICS, v.38, no.1, pp.95 - 99, 1995-01 |
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