Showing results 1 to 5 of 5
Atomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidant Maeng, W. J.; Choi, Dong-won; Park, Jozeph; Park, Jin-Seong, CERAMICS INTERNATIONAL, v.41, no.9, pp.10782 - 10787, 2015-11 |
Indium oxide thin film prepared by low temperature atomic layer deposition using liquid precursors and ozone oxidant Maeng, W. J.; Choi, Dong-Won; Park, Jozeph; Park, Jin-Seong, JOURNAL OF ALLOYS AND COMPOUNDS, v.649, pp.216 - 221, 2015-11 |
Performance modulation of transparent ALD indium oxide films on flexible substrates: transition between metal-like conductor and high performance semiconductor states Sheng, Jiazhen; Choi, Dong-Won; Lee, Seung-Hwan; Park, Jozeph; Park, Jin-Seong, JOURNAL OF MATERIALS CHEMISTRY C, v.4, no.32, pp.7571 - 7576, 2016 |
Shrinking Core Model for Knudsen Diffusion-Limited Atomic Layer Deposition on a Nanoporous Monolith with an Ultrahigh Aspect Ratio Lee H.-Y.; An C.J.; Piao S.J.; Ahn D.Y.; Kim M.-T.; Min Y.-S., JOURNAL OF PHYSICAL CHEMISTRY C, v.114, no.43, pp.18601 - 18606, 2010 |
The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O-3) oxidants Park, J.; Jung, Tae-Hoon; Lee, Jung-Hoon; Kim, Hyun-Suk; Park, Jin-Seong, CERAMICS INTERNATIONAL, v.41, no.1, pp.1839 - 1845, 2015-01 |
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