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High Performance Low Temperature Polysilicon Thin Film Transistor Using ECR Plasma Thermal Oxide as Gate Insulator J.Y.Lee; C.H.Han; Kim, Choong Ki, IEEE ELECTRON DEVICE LETTERS, v.15, no.8, pp.301 - 303, 1994-08 |
Improving the Stability of High-Performance Multilayer MoS2 Field-Effect Transistors Liu, Na; Baek, Jongyeol; Kim, Seung Min; Hong, Seongin; Hong, Young Ki; Kim, Yang Soo; Kim, Hyun-Suk; et al, ACS APPLIED MATERIALS & INTERFACES, v.9, no.49, pp.42943 - 42950, 2017-12 |
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