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Does short wavelength lithography process degrade the integrity of thin gate oxide? Kim, SJ; Cho, Byung Jin; Chong, PF; Chor, EF; Ang, CH; Ling, CH; Joo, MS; et al, MICROELECTRONICS RELIABILITY, v.40, pp.1609 - 1613, 2000-10 |
Electron beam damage in the SiN membrane of an X-ray lithography mask Choi, Sang-Soo; Kim, Jong Soo; Chung, Hai Bin; Yoo, Hyung Joun; Kim, Bo-Woo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.1, pp.360 - 363, 1998-01 |
Reliability of thin gate oxides irradiated under X-ray lithography conditions Cho, Byung Jin; Kim, SJ; Ang, CH; Ling, CH; Joo, MS; Yeo, IS, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.40, no.4B, pp.2819 - 2822, 2001-04 |
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