Showing results 1 to 10 of 10
Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition Chen, XY; Lu, YF; Tang, LJ; Wu, YH; Cho, Byung Jin; Xu, XJ; Dong, JR; et al, JOURNAL OF APPLIED PHYSICS, v.97, no.1, 2005-01 |
Laser annealing of silicon nanocrystal films formed by pulsed-laser deposition Tan, CF; Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Zeng, JN, JOURNAL OF LASER APPLICATIONS, v.16, no.1, pp.40 - 45, 2004-02 |
Laser annealing of silicon nanocrystal films prepared by pulsed-laser deposition Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Yang, BJ; Liew, TYF, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.22, no.4, pp.1731 - 1737, 2004-06 |
Material and electrical characterization of HfO2 films for MIM capacitors applications Cho, Byung Jin; Hu, H; Zhu, C; Lu, YF; Zeng, JN; Wu, YH; Liew, YF, MRS Spring meeting, pp.0 - 0, 2003-04-22 |
Mechanisms of photoluminescence from silicon nanocrystals formed by pulsed-laser deposition in argon and oxygen ambient Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Liu, MH; Dai, DY; Song, WD, JOURNAL OF APPLIED PHYSICS, v.93, no.10, pp.6311 - 6319, 2003-05 |
Optical properties of SiOx nanostructured films by pulsed-laser deposition at different substrate temperatures Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Song, WD; Dai, DY, JOURNAL OF APPLIED PHYSICS, v.96, no.6, pp.3180 - 3186, 2004-09 |
Pattern-induced ripple structures at silicon-oxide/silicon interface by excimer laser irradiation Chen, XY; Lu, YF; Cho, Byung Jin; Zeng, YP; Zeng, JN; Wu, YH, APPLIED PHYSICS LETTERS, v.81, no.7, pp.1344 - 1346, 2002-08 |
Photoluminescene from silicon nanocrystals formed by pulsed laser deposition Cho, Byung Jin; Chen, XY; Lu, YF; Wu, YH; Song, WD; Hu, H, MRS Symposium, pp.13 - 13, 2003-04-22 |
Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications Hu, H; Zhu, CX; Lu, YF; Wu, YH; Liew, T; Li, MF; Cho, Byung Jin; et al, JOURNAL OF APPLIED PHYSICS, v.94, no.1, pp.551 - 557, 2003-07 |
Silicon nanostructured films formed by pulsed-laser deposition in inert gas and reactive gas Cho, Byung Jin; Chen, XY; Lu, YF; Wu, YH; Hu, H, MRS Symposium, pp.19 - 19, 2003-04-21 |
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