Browse "School of Electrical Engineering(전기및전자공학부)" by Author Chung, HB
Showing results 1 to 7 of 7
| Catadioptric system design for ArF excimer laser lithography Chung, HB; Lee, KH; Yoo, Hyung Joun, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.29, no.3, pp.305 - 309, 1996-06 |
| Correlation of the vector diffraction effect on the optical lithographic image of a binary mask with magnification of the projection system Jhun, Y; Kim, S; Lee, S; Chung, HB; Yoo, Hyung Joun, APPLIED OPTICS, v.37, no.13, pp.2542 - 2549, 1998-05 |
| Design and tolerancing of ArF excimer laser optics for lithography Chung, HB; Lee, KH; Kim, DH; Yoo, Hyung Joun, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.30, no.3, pp.534 - 539, 1997-06 |
| Effect of degree of coherence in optical lithography using dummy diffraction mask Yim, D; Lee, S; Lee, S; Oh, YH; Chung, HB; Yoo, Hyung Joun, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.35, no.2A, pp.780 - 785, 1996-02 |
| Exposure latitude and CD control study for additively patterned x-ray mask with GBit DRAM complexity. Baciocchi, M; DiFabrizio, E; Gentili, M; Grella, L; Maggiora, L; Mastrogiacomo, L; Peschiaroli, D; et al, MICROELECTRONIC ENGINEERING, v.30, no.1-4, pp.195 - 198, 1996-01 |
| Fabrication of a 0.1-mu m T-shaped gate with wide head for super low noise HEMTs Choi, SS; Lee, JH; Yoon, HS; Chung, HB; Lee, SY; Yoo, Hyung Joun, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.28, no.6, pp.768 - 772, 1995-12 |
| KrF excimer laser lithography with a dummy diffraction mask Kim, DH; Park, BS; Chung, HB; Lee, JH; Yoo, Hyung Joun; Oh, YH, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.29, no.3, pp.317 - 320, 1996-06 |
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