Browse "School of Electrical Engineering(전기및전자공학부)" by Subject TRAPS

Showing results 1 to 6 of 6

1
Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films

Ang, CH; Ling, CH; Cheng, ZY; Kim, SJ; Cho, Byung Jin, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.147, no.12, pp.4676 - 4682, 2000-12

2
Comprehensive modeling of resistive switching in the Al/TiOx/TiO2/Al heterostructure based on space-charge-limited conduction

Kim, Sung-Ho; Jeong, Hu-Young; Choi, Sung-Yool; Choi, Yang-Kyu, APPLIED PHYSICS LETTERS, v.97, no.3, 2010-07

3
Experimental evidence of interface-controlled mechanism of quasi-breakdown in ultrathin gate oxide

Guan, H; Cho, Byung Jin; Li, MF; Xu, Z; He, YD; Dong, Z, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.48, no.5, pp.1010 - 1013, 2001-05

4
Negative bias temperature instability on plasma-nitrided silicon dioxide film

Ang, CH; Lek, CM; Tan, SS; Cho, Byung Jin; Chen, TP; Lin, WH; Zhen, JZ, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.41, no.3B, pp.314 - 316, 2002-03

5
Performance comparison of wet-etched and dry-etched Geiger-mode avalanche photodiodes using a single diffusion process

Lee, Ki Won; Yang, Kyounghoon, PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, v.10, no.11, pp.1445 - 1447, 2013-11

6
Reduction of stress-induced leakage currents in thin oxides by application of a low post-stress gate bias

Ang, CH; Ling, CH; Cheng, ZY; Cho, Byung Jin; Kim, SJ, JOURNAL OF APPLIED PHYSICS, v.88, no.5, pp.3087 - 3089, 2000-09

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