Showing results 1 to 6 of 6
Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition Chen, XY; Lu, YF; Tang, LJ; Wu, YH; Cho, Byung Jin; Xu, XJ; Dong, JR; et al, JOURNAL OF APPLIED PHYSICS, v.97, no.1, 2005-01 |
Correlation between optical properties and Si nanocrystal formation of Si-rich Si oxide films prepared by plasma-enhanced chemical vapor deposition Chen, X. Y.; Lu, Y. F.; Wu, Y. H.; Cho, Byung Jin; Tang, L. J.; Lu, D.; Dong, J. R., APPLIED SURFACE SCIENCE, v.253, no.5, pp.2718 - 2726, 2006-12 |
Laser annealing of silicon nanocrystal films formed by pulsed-laser deposition Tan, CF; Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Zeng, JN, JOURNAL OF LASER APPLICATIONS, v.16, no.1, pp.40 - 45, 2004-02 |
Laser annealing of silicon nanocrystal films prepared by pulsed-laser deposition Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Yang, BJ; Liew, TYF, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.22, no.4, pp.1731 - 1737, 2004-06 |
Mechanisms of photoluminescence from silicon nanocrystals formed by pulsed-laser deposition in argon and oxygen ambient Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Liu, MH; Dai, DY; Song, WD, JOURNAL OF APPLIED PHYSICS, v.93, no.10, pp.6311 - 6319, 2003-05 |
Optical properties of SiOx nanostructured films by pulsed-laser deposition at different substrate temperatures Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Song, WD; Dai, DY, JOURNAL OF APPLIED PHYSICS, v.96, no.6, pp.3180 - 3186, 2004-09 |
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