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ACTIVATION AND RECRYSTALLIZATION OF ION-IMPLANTED AMORPHOUS-SILICON FILMS BY RAPID THERMAL ANNEALING KIM, YT; Yoo, Hyung Joun; JUN, CH; JANG, WI; KIM, SH, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.7, no.3, pp.796 - 801, 1989-05 |
SENSITIVITY ANALYSIS OF ION-IMPLANTED SILICON-WAFERS AFTER RAPID THERMAL ANNEALING KIM, YT; JUN, CH; BAEK, JT; Yoo, Hyung Joun, JOURNAL OF ELECTRONIC MATERIALS, v.24, no.10, pp.1413 - 1417, 1995-10 |
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