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Fabrication and characterization of MFISFET using Al2O3 insulating layer for non-volatile memory Shin, C.H.; Cha, S.Y.; Lee, Hee Chul; Lee, W.-J.; Yu, B.-G.; Kwak, D.-H., 12th International Symposium on Integrated Ferroelectrics, v.34, no.40547, 2000-03-12 |
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