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Multiple-pulse laser annealing of preamorphized silicon for ultrashallow boron junction formation Poon, CH; Cho, Byung Jin; Lu, YF; Bhat, M; See, A, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.21, no.2, pp.706 - 709, 2003-02 |
Raman spectroscopy investigation on excimer laser annealing and thickness determination of nanoscale amorphous silicon Zeng, YP; Lu, YF; Shen, ZX; Sun, WX; Yu, T; Liu, L; Zeng, JN; et al, NANOTECHNOLOGY, v.15, no.5, pp.658 - 662, 2004-05 |
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