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2D self-aligned via patterning strategy with EUV single exposure in 3nm technology Choi, Suhyeong; Lee, Jae Uk; Carballo, Victor M. Blanco; Kim, Ryoung-Han; Shin, Youngsoo, Conference on Extreme Ultraviolet (EUV) Lithography VIII, SPIE, 2017-02-26 |
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