DC Field | Value | Language |
---|---|---|
dc.contributor.author | Solak, HH | ko |
dc.contributor.author | David, C | ko |
dc.contributor.author | Gobrecht, J | ko |
dc.contributor.author | Golovkina, V | ko |
dc.contributor.author | Cerrina, F | ko |
dc.contributor.author | Kim, Sang Ouk | ko |
dc.contributor.author | Nealey, PF | ko |
dc.date.accessioned | 2010-11-15T06:08:04Z | - |
dc.date.available | 2010-11-15T06:08:04Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-06 | - |
dc.identifier.citation | MICROELECTRONIC ENGINEERING, v.67-8, pp.56 - 62 | - |
dc.identifier.issn | 0167-9317 | - |
dc.identifier.uri | http://hdl.handle.net/10203/19914 | - |
dc.description.abstract | We have used transmission diffraction gratings in an interferometric setup to pattern one- and two dimensional periodic patterns with periods near 50 nm. The diffraction gratings were written with e-beam lithography. The exposures were made at 13.4 nm wavelength with undulator radiation, which provides spatially coherent radiation. This technique offered a multiplication of pattern frequency by a factor of 2 and root2 in the one- and two-dimensional cases, respectively. Interference lithography with gratings offers a number of advantages, including achromaticity and insensitivity to misalignment. The demonstrated structures include line/space patterns with 45 nm period and a square array of holes with 56 nm period. (C) 2003 Elsevier Science B.V. All rights reserved. | - |
dc.description.sponsorship | The authors thank B. Haas and S. Stutz for help with preparation of the diffraction grating masks. | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | GRATINGS | - |
dc.title | Sub-50 nm period patterns with EUV interference lithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000183842100009 | - |
dc.identifier.scopusid | 2-s2.0-0038021007 | - |
dc.type.rims | ART | - |
dc.citation.volume | 67-8 | - |
dc.citation.beginningpage | 56 | - |
dc.citation.endingpage | 62 | - |
dc.citation.publicationname | MICROELECTRONIC ENGINEERING | - |
dc.identifier.doi | 10.1016/S0167-9317(03)00059-5 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kim, Sang Ouk | - |
dc.contributor.nonIdAuthor | Solak, HH | - |
dc.contributor.nonIdAuthor | David, C | - |
dc.contributor.nonIdAuthor | Gobrecht, J | - |
dc.contributor.nonIdAuthor | Golovkina, V | - |
dc.contributor.nonIdAuthor | Cerrina, F | - |
dc.contributor.nonIdAuthor | Nealey, PF | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | interference lithography | - |
dc.subject.keywordAuthor | multiple beam | - |
dc.subject.keywordAuthor | extreme ultraviolet | - |
dc.subject.keywordAuthor | diffraction grating | - |
dc.subject.keywordAuthor | undulator | - |
dc.subject.keywordPlus | GRATINGS | - |
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