Synthesis of ultrathin polymer insulating layers by initiated chemical vapour deposition for low-power soft electronics

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dc.contributor.authorMoon, Hanulko
dc.contributor.authorSeong, Hyejeongko
dc.contributor.authorShin, Woo Cheolko
dc.contributor.authorPark, Won-Taeko
dc.contributor.authorKim, Mincheolko
dc.contributor.authorLee, Seungwonko
dc.contributor.authorBong, Jae Hoonko
dc.contributor.authorNoh, Yong-Youngko
dc.contributor.authorCho, Byung-Jinko
dc.contributor.authorYoo, Seung-Hyupko
dc.contributor.authorIm, SungGapko
dc.date.accessioned2015-06-25T06:23:54Z-
dc.date.available2015-06-25T06:23:54Z-
dc.date.created2015-04-15-
dc.date.created2015-04-15-
dc.date.created2015-04-15-
dc.date.created2015-04-15-
dc.date.created2015-04-15-
dc.date.issued2015-06-
dc.identifier.citationNATURE MATERIALS, v.14, no.6, pp.628 - 635-
dc.identifier.issn1476-1122-
dc.identifier.urihttp://hdl.handle.net/10203/199055-
dc.description.abstractInsulating layers based on oxides and nitrides provide high capacitance, low leakage, high breakdown field and resistance to electrical stresses when used in electronic devices based on rigid substrates. However, their typically high process temperatures and brittleness make it difficult to achieve similar performance in flexible or organic electronics. Here, we show that poly(1,3,5-trimethyl-1,3,5-trivinyl cyclotrisiloxane) (pV3D3) prepared via a one-step, solvent-free technique called initiated chemical vapour deposition (iCVD) is a versatile polymeric insulating layer that meets a wide range of requirements for next-generation electronic devices. Highly uniform and pure ultrathin films of pV3D3 with excellent insulating properties, a large energy gap (>8 eV), tunnelling-limited leakage characteristics and resistance to a tensile strain of up to 4% are demonstrated. The low process temperature, surface-growth character, and solvent-free nature of the iCVD process enable pV3D3 to be grown conformally on plastic substrates to yield flexible field-effect transistors as well as on a variety of channel layers, including organics, oxides, and graphene.-
dc.languageEnglish-
dc.publisherNATURE PUBLISHING GROUP-
dc.titleSynthesis of ultrathin polymer insulating layers by initiated chemical vapour deposition for low-power soft electronics-
dc.typeArticle-
dc.identifier.wosid000354801500027-
dc.identifier.scopusid2-s2.0-84929964747-
dc.type.rimsART-
dc.citation.volume14-
dc.citation.issue6-
dc.citation.beginningpage628-
dc.citation.endingpage635-
dc.citation.publicationnameNATURE MATERIALS-
dc.identifier.doi10.1038/NMAT4237-
dc.contributor.localauthorCho, Byung-Jin-
dc.contributor.localauthorYoo, Seung-Hyup-
dc.contributor.localauthorIm, SungGap-
dc.contributor.nonIdAuthorPark, Won-Tae-
dc.contributor.nonIdAuthorBong, Jae Hoon-
dc.contributor.nonIdAuthorNoh, Yong-Young-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusORGANIC TRANSISTORS-
dc.subject.keywordPlusINTEGRATED-CIRCUITS-
dc.subject.keywordPlusGATE DIELECTRICS-
dc.subject.keywordPlusGRAPHENE FILMS-
dc.subject.keywordPlusLARGE-AREA-
dc.subject.keywordPlusACRYLATES)-
dc.subject.keywordPlusSTABILITY-
dc.subject.keywordPlusICVD-
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