Under the spotlight on green chemistry, there has been increasing interest in developing a new type of resist which is eco-friendly, water castable or water developable. These resists would offer not only environmental friendlyness but also reduce the manufacturing cost. Most of water-processable photoresist systems contain photoacid generators to obtain high sensitivity. The photoacid generators are low molecular weight and possibly toxic compounds which might eventually pollute the environment. We could solve the problems related to the chemically amplified resists systems by using diazoketo groups as photoactive components.