DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Woon Ik | ko |
dc.contributor.author | Kim, Jong Min | ko |
dc.contributor.author | Jeong, Jae Won | ko |
dc.contributor.author | Jung, Yeon Sik | ko |
dc.date.accessioned | 2015-04-06T05:56:08Z | - |
dc.date.available | 2015-04-06T05:56:08Z | - |
dc.date.created | 2014-12-09 | - |
dc.date.created | 2014-12-09 | - |
dc.date.issued | 2014-10 | - |
dc.identifier.citation | ACS NANO, v.8, no.10, pp.10009 - 10018 | - |
dc.identifier.issn | 1936-0851 | - |
dc.identifier.uri | http://hdl.handle.net/10203/194734 | - |
dc.description.abstract | The directed self-assembly (DSA) of block copolymers (BCPs) is expected to complement conventional optical lithography due to its excellent pattern resolution and cost-effectiveness. Recent studies have shown that BCPs with a large Flory-Huggins interaction parameter (gamma) are critical for a reduction of the thermodynamic defect density as well as an increase in pattern density. However, due to their slower self-assembly kinetics, high-gamma BCPs typically necessitate solvent vapor annealing, which requires complex facilities and procedures compared to simple thermal annealing. Here, we introduce an immersion-triggered directed self-assembly (iDSA) process and demonstrate the combined advantages of excellent simplicity, productivity, large-area capability, and tunability. We show that the vapor-free, simple immersion of high-gamma BCPs in a composition-optimized mixture of nonswelling and swelling solvents can induce the ultrafast (=5 min) formation of nanoscale patterns with a pattern size ranging from 8-18 nm. Moreover, iDSA enables the reversible formation of seven different nanostructures from one sphere-forming BCP, demonstrating the outstanding controllability of this self-assembly route. | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | BLOCK-COPOLYMER BLENDS | - |
dc.subject | THIN-FILMS | - |
dc.subject | GRAPHOEPITAXY | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | ARRAYS | - |
dc.subject | NANOSTRUCTURES | - |
dc.subject | PHOTORESIST | - |
dc.subject | ORIENTATION | - |
dc.subject | TEMPERATURE | - |
dc.subject | RESOLUTION | - |
dc.title | Deep-Nanoscale Pattern Engineering by Immersion-Induced Self-Assembly | - |
dc.type | Article | - |
dc.identifier.wosid | 000343952600034 | - |
dc.identifier.scopusid | 2-s2.0-84908432407 | - |
dc.type.rims | ART | - |
dc.citation.volume | 8 | - |
dc.citation.issue | 10 | - |
dc.citation.beginningpage | 10009 | - |
dc.citation.endingpage | 10018 | - |
dc.citation.publicationname | ACS NANO | - |
dc.identifier.doi | 10.1021/nn504995c | - |
dc.contributor.localauthor | Jung, Yeon Sik | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | immersion | - |
dc.subject.keywordAuthor | sub-15 nm | - |
dc.subject.keywordAuthor | polymer | - |
dc.subject.keywordAuthor | self-assembly | - |
dc.subject.keywordAuthor | lithography | - |
dc.subject.keywordPlus | BLOCK-COPOLYMER BLENDS | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | GRAPHOEPITAXY | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.subject.keywordPlus | PHOTORESIST | - |
dc.subject.keywordPlus | ORIENTATION | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | RESOLUTION | - |
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