Boron diffusion mechanism and effect of interface Ge atoms in Si/SiO2 and SiGe/SiO2 interfaces
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Geun Myeong | - |
| dc.contributor.author | Oh, Young-Jun | - |
| dc.contributor.author | 이창휘 | - |
| dc.contributor.author | Chang, Kee-Joo | - |
| dc.date.accessioned | 2015-03-27T05:57:05Z | - |
| dc.date.available | 2015-03-27T05:57:05Z | - |
| dc.date.created | 2015-01-06 | - |
| dc.date.issued | 2014-03 | - |
| dc.identifier.citation | 2014 APS March Meeting, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/194361 | - |
| dc.language | ENG | - |
| dc.publisher | APS | - |
| dc.title | Boron diffusion mechanism and effect of interface Ge atoms in Si/SiO2 and SiGe/SiO2 interfaces | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 2014 APS March Meeting | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | Kim, Geun Myeong | - |
| dc.contributor.localauthor | Oh, Young-Jun | - |
| dc.contributor.localauthor | Chang, Kee-Joo | - |
| dc.contributor.nonIdAuthor | 이창휘 | - |
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