Synergistic effects of coumarin and cis-2-butene-1,4-diol on high speed electrodeposition of nickel

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dc.contributor.authorNam, Do-Hwanko
dc.contributor.authorHong, Kyung-Sikko
dc.contributor.authorKim, Jong-Sooko
dc.contributor.authorLee, Jong-Lokko
dc.contributor.authorKim, Go-Eunko
dc.contributor.authorKwon, Hyuk-Sangko
dc.date.accessioned2014-09-01T06:41:18Z-
dc.date.available2014-09-01T06:41:18Z-
dc.date.created2014-06-23-
dc.date.created2014-06-23-
dc.date.issued2014-06-
dc.identifier.citationSURFACE & COATINGS TECHNOLOGY, v.248, pp.30 - 37-
dc.identifier.issn0257-8972-
dc.identifier.urihttp://hdl.handle.net/10203/189129-
dc.description.abstractThe individual and synergistic effects of coumarin and cis-2-butene-1,4-diol on the surface morphology and the crystal structure of Ni electrodeposits at a high cathodic current density were investigated using SEM, XRD, SIM and electrochemical analyses. While the rough Ni layer composed of spiral-type deposits was deposited from an additive-free bath, the electrodeposits with a smooth and bright surface were prepared from the coumarincontaining bath. XRD analysis and the cross-sectional observation suggested that coumarin promotes the large columnar growth of Ni crystallites along [200] directions, resulting in the production of a highly leveled electrodeposition layer. In contrast, cis-2-butene-1,4-diol showed strong grain refining effects on the Ni electrodeposition by the suppressive effects on the every mode of the crystal growth except [220] orientation, resulting in a significant promotion of the Ni crystal nucleation. When both coumarin and cis-2-butene-1,4-diol were contained in the bath, highly smoothed Ni electrodeposits were deposited by the synergistic effects of the additives.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectBLOCKING INHIBITORS-
dc.subjectELECTROCRYSTALLIZATION-
dc.titleSynergistic effects of coumarin and cis-2-butene-1,4-diol on high speed electrodeposition of nickel-
dc.typeArticle-
dc.identifier.wosid000336017600004-
dc.identifier.scopusid2-s2.0-84899621168-
dc.type.rimsART-
dc.citation.volume248-
dc.citation.beginningpage30-
dc.citation.endingpage37-
dc.citation.publicationnameSURFACE & COATINGS TECHNOLOGY-
dc.identifier.doi10.1016/j.surfcoat.2014.03.031-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKwon, Hyuk-Sang-
dc.contributor.nonIdAuthorLee, Jong-Lok-
dc.contributor.nonIdAuthorKim, Go-Eun-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorNickel-
dc.subject.keywordAuthorElectrodeposition-
dc.subject.keywordAuthorCoumarin-
dc.subject.keywordAuthorCis-2-butene-1,4-diol-
dc.subject.keywordAuthorMicrostructure-
dc.subject.keywordPlusBLOCKING INHIBITORS-
dc.subject.keywordPlusELECTROCRYSTALLIZATION-
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