DC Field | Value | Language |
---|---|---|
dc.contributor.author | Nam, Do-Hwan | ko |
dc.contributor.author | Hong, Kyung-Sik | ko |
dc.contributor.author | Kim, Jong-Soo | ko |
dc.contributor.author | Lee, Jong-Lok | ko |
dc.contributor.author | Kim, Go-Eun | ko |
dc.contributor.author | Kwon, Hyuk-Sang | ko |
dc.date.accessioned | 2014-09-01T06:41:18Z | - |
dc.date.available | 2014-09-01T06:41:18Z | - |
dc.date.created | 2014-06-23 | - |
dc.date.created | 2014-06-23 | - |
dc.date.issued | 2014-06 | - |
dc.identifier.citation | SURFACE & COATINGS TECHNOLOGY, v.248, pp.30 - 37 | - |
dc.identifier.issn | 0257-8972 | - |
dc.identifier.uri | http://hdl.handle.net/10203/189129 | - |
dc.description.abstract | The individual and synergistic effects of coumarin and cis-2-butene-1,4-diol on the surface morphology and the crystal structure of Ni electrodeposits at a high cathodic current density were investigated using SEM, XRD, SIM and electrochemical analyses. While the rough Ni layer composed of spiral-type deposits was deposited from an additive-free bath, the electrodeposits with a smooth and bright surface were prepared from the coumarincontaining bath. XRD analysis and the cross-sectional observation suggested that coumarin promotes the large columnar growth of Ni crystallites along [200] directions, resulting in the production of a highly leveled electrodeposition layer. In contrast, cis-2-butene-1,4-diol showed strong grain refining effects on the Ni electrodeposition by the suppressive effects on the every mode of the crystal growth except [220] orientation, resulting in a significant promotion of the Ni crystal nucleation. When both coumarin and cis-2-butene-1,4-diol were contained in the bath, highly smoothed Ni electrodeposits were deposited by the synergistic effects of the additives. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | BLOCKING INHIBITORS | - |
dc.subject | ELECTROCRYSTALLIZATION | - |
dc.title | Synergistic effects of coumarin and cis-2-butene-1,4-diol on high speed electrodeposition of nickel | - |
dc.type | Article | - |
dc.identifier.wosid | 000336017600004 | - |
dc.identifier.scopusid | 2-s2.0-84899621168 | - |
dc.type.rims | ART | - |
dc.citation.volume | 248 | - |
dc.citation.beginningpage | 30 | - |
dc.citation.endingpage | 37 | - |
dc.citation.publicationname | SURFACE & COATINGS TECHNOLOGY | - |
dc.identifier.doi | 10.1016/j.surfcoat.2014.03.031 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kwon, Hyuk-Sang | - |
dc.contributor.nonIdAuthor | Lee, Jong-Lok | - |
dc.contributor.nonIdAuthor | Kim, Go-Eun | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | Nickel | - |
dc.subject.keywordAuthor | Electrodeposition | - |
dc.subject.keywordAuthor | Coumarin | - |
dc.subject.keywordAuthor | Cis-2-butene-1,4-diol | - |
dc.subject.keywordAuthor | Microstructure | - |
dc.subject.keywordPlus | BLOCKING INHIBITORS | - |
dc.subject.keywordPlus | ELECTROCRYSTALLIZATION | - |
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