DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeong, Seong-Jun | ko |
dc.contributor.author | Kim, Ju Young | ko |
dc.contributor.author | Kim, Bong Hoon | ko |
dc.contributor.author | Moon, Hyoung-Seok | ko |
dc.contributor.author | Kim, Sang Ouk | ko |
dc.date.accessioned | 2014-08-29T01:15:00Z | - |
dc.date.available | 2014-08-29T01:15:00Z | - |
dc.date.created | 2014-01-20 | - |
dc.date.created | 2014-01-20 | - |
dc.date.issued | 2013-12 | - |
dc.identifier.citation | MATERIALS TODAY, v.16, no.12, pp.468 - 476 | - |
dc.identifier.issn | 1369-7021 | - |
dc.identifier.uri | http://hdl.handle.net/10203/188714 | - |
dc.description.abstract | Directed self-assembly of block copolymers has received a great deal of research attention as a promising nanolithography to complement the intrinsic limitations of conventional photolithography. In this review, we highlight the recent progress in the development of the directed self-assembly process for practical utilization in semiconductor applications. Various advanced directed self-assembly approaches are examined, in which block copolymer self-assembly is synergistically integrated with conventional photolithography, such as ArF lithography or I-line lithography, via either epitaxial self-assembly or the graphoepitaxy principle. We focus on the practical advantages anticipated from directed self-assembly integration, such as pattern density multiplication, feature size uniformity improvement, line edge roughness reduction, as well as cost reduction. Additionally, a direction for future research on directed self-assembly is suggested with diverse potential applications. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCI LTD | - |
dc.subject | OPTICAL LITHOGRAPHY | - |
dc.subject | SOFT GRAPHOEPITAXY | - |
dc.subject | DIBLOCK COPOLYMER | - |
dc.subject | SURFACE PATTERNS | - |
dc.subject | SQUARE ARRAYS | - |
dc.subject | LARGE-AREA | - |
dc.subject | POLYSTYRENE | - |
dc.subject | TEMPLATES | - |
dc.subject | POLYMERS | - |
dc.subject | PHOTORESIST | - |
dc.title | Directed self-assembly of block copolymers for next generation nanolithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000328640100015 | - |
dc.identifier.scopusid | 2-s2.0-84890392162 | - |
dc.type.rims | ART | - |
dc.citation.volume | 16 | - |
dc.citation.issue | 12 | - |
dc.citation.beginningpage | 468 | - |
dc.citation.endingpage | 476 | - |
dc.citation.publicationname | MATERIALS TODAY | - |
dc.identifier.doi | 10.1016/j.mattod.2013.11.002 | - |
dc.contributor.localauthor | Kim, Sang Ouk | - |
dc.contributor.nonIdAuthor | Jeong, Seong-Jun | - |
dc.contributor.nonIdAuthor | Kim, Ju Young | - |
dc.contributor.nonIdAuthor | Kim, Bong Hoon | - |
dc.contributor.nonIdAuthor | Moon, Hyoung-Seok | - |
dc.description.isOpenAccess | Y | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | OPTICAL LITHOGRAPHY | - |
dc.subject.keywordPlus | SOFT GRAPHOEPITAXY | - |
dc.subject.keywordPlus | DIBLOCK COPOLYMER | - |
dc.subject.keywordPlus | SURFACE PATTERNS | - |
dc.subject.keywordPlus | SQUARE ARRAYS | - |
dc.subject.keywordPlus | LARGE-AREA | - |
dc.subject.keywordPlus | POLYSTYRENE | - |
dc.subject.keywordPlus | TEMPLATES | - |
dc.subject.keywordPlus | POLYMERS | - |
dc.subject.keywordPlus | PHOTORESIST | - |
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