Plasma density measurement with ring-type cutoff probe

Cited 3 time in webofscience Cited 2 time in scopus
  • Hit : 367
  • Download : 36
DC FieldValueLanguage
dc.contributor.authorKim, D. W.ko
dc.contributor.authorYou, S. J.ko
dc.contributor.authorNa, Byungkeunko
dc.contributor.authorKim, J. H.ko
dc.contributor.authorShin, YHko
dc.contributor.authorChang, Hong-Youngko
dc.contributor.authorOh, Wang-Yuhlko
dc.date.accessioned2014-08-28T08:20:24Z-
dc.date.available2014-08-28T08:20:24Z-
dc.date.created2013-11-25-
dc.date.created2013-11-25-
dc.date.created2013-11-25-
dc.date.issued2013-11-
dc.identifier.citationTHIN SOLID FILMS, v.547, pp.280 - 284-
dc.identifier.issn0040-6090-
dc.identifier.urihttp://hdl.handle.net/10203/188490-
dc.description.abstractWe proposed a cutoff probe with a ring-type detection tip enclosing a bar-type radiation tip. A comparative study between a proposed ring-type cutoff (RTC) probe and a conventional bar-type cutoff (BTC) probe showed that the RTC probe solved the problem of the BTC probe, the large measurement uncertainty of the electron density in a capacitively coupled plasma source. This improved characteristics of the RTC probe might have originated from the geometrical structure of the RTC probe concerning the monopole antennae radiation. This proposed cutoff probe can be expected to expand the applicable diagnostic range and to enhance the sensitivity of the cutoff probe. (C) 2012 Elsevier B. V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.titlePlasma density measurement with ring-type cutoff probe-
dc.typeArticle-
dc.identifier.wosid000326036100058-
dc.identifier.scopusid2-s2.0-84886793490-
dc.type.rimsART-
dc.citation.volume547-
dc.citation.beginningpage280-
dc.citation.endingpage284-
dc.citation.publicationnameTHIN SOLID FILMS-
dc.identifier.doi10.1016/j.tsf.2012.11.049-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorChang, Hong-Young-
dc.contributor.localauthorOh, Wang-Yuhl-
dc.contributor.nonIdAuthorKim, D. W.-
dc.contributor.nonIdAuthorYou, S. J.-
dc.contributor.nonIdAuthorKim, J. H.-
dc.contributor.nonIdAuthorShin, YH-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle; Proceedings Paper-
dc.subject.keywordAuthorPlasma diagnostics-
dc.subject.keywordAuthorCutoff probe-
dc.subject.keywordAuthorMicrowave probe-
dc.subject.keywordAuthorProcessing monitoring-
dc.subject.keywordAuthorPlasma density measurement-
dc.subject.keywordPlusABSOLUTE ELECTRON-DENSITY-
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 3 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0