A novel molecular resist for EUV lithography극 자외선 리소그래피용 분자 레지스트에 관한 연구

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 1850
  • Download : 0
DC FieldValueLanguage
dc.contributor.advisorKim, Jin-Baek-
dc.contributor.advisor김진백-
dc.contributor.authorJeong, Sun-Hwa-
dc.contributor.author정선화-
dc.date.accessioned2013-09-12T01:45:13Z-
dc.date.available2013-09-12T01:45:13Z-
dc.date.issued2013-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=515238&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/180323-
dc.description학위논문(석사) - 한국과학기술원 : 화학과, 2013.2, [ vi, 39 p. ]-
dc.description.abstractThe continued request for miniaturization of feature sizes in microelectronic, optoelectronic, and microelectromechanical systems places strong demands on the lithographic and patterning processes used to fabricate such devices. A EUV lithography, using low wavelength region (13.4 nm) so small size pattern obtained. Because EUV source is relatively low, the novel EUV resist required low sensitivity needed. A novel molecular resist was synthesized with the core material is bisphenol A oligomer and substitute is 7-membered lactone. This 7-membered lactone moiety was synthesized from camphor by Bayer-Villiger oxidation. 7-membered lactone group of the matrix bisphenol A oligomer was cleaved and the carboxylic acid functionality was formed by acid-catalyzed ring-opening reaction in the exposure region after post-exposure bake. This cyclic lactone group do not produce volatile byproduct and the molecular resist have low sensitivity, thus can be used for EUV resist. And eventually, we successfully obtained the positive tone images featuring micro-size line and space patterns..eng
dc.languageeng-
dc.publisher한국과학기술원-
dc.subjectEUV lithography-
dc.subjectmolecular resist-
dc.subject극 자외선 리소그래피-
dc.subject분자 레지스트-
dc.subject저 가스발생-
dc.subjectnon-outgassing-
dc.titleA novel molecular resist for EUV lithography-
dc.title.alternative극 자외선 리소그래피용 분자 레지스트에 관한 연구-
dc.typeThesis(Master)-
dc.identifier.CNRN515238/325007 -
dc.description.department한국과학기술원 : 화학과, -
dc.identifier.uid020113562-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.localauthor김진백-
Appears in Collection
CH-Theses_Master(석사논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0