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Effect of annealing temperature on the electrical transport properties of CaRuO3-delta thin films directly deposited on the Si substrate Paik, H; Kim, Y; No, Kwangsoo; Cann, DP; Yoon, D; Kim, B, PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, v.204, pp.2339 - 2346, 2007-07 |
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