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Effects of NH3 flow rate on the epitaxial growth of CoSi2 thin film using a CoN (x) interlayer deposited by MOCVD Lee, Seung Ryul; Ahn, Byung-Tae; Kang, Bo Soo, APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.119, no.4, pp.1437 - 1441, 2015-06 |
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