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Concurrent Optimization of Diffraction Fields from Binary Phase Mask for Three-Dimensional Nanopatterning Lee, Chihun; Chang, Gunho; Kim, Jaekyung; Hyun, Gayea; Bae, Gwangmin; So, Sunae; Yun, Jooyeong; et al, ACS PHOTONICS, v.10, no.4, pp.919 - 927, 2023-04 |
Fundamental principles and development of proximity-field nanopatterning toward advanced 3D nanofabrication Nam, Sang-Hyeon; Hyun, Gayea; Cho, Donghwi; Han, Seonggon; Bae, Gwangmin; Chen, Haomin; Kim, Kisun; et al, NANO RESEARCH, v.14, no.9, pp.2965 - 2980, 2021-09 |
Sub-50 nm period patterns with EUV interference lithography Solak, HH; David, C; Gobrecht, J; Golovkina, V; Cerrina, F; Kim, Sang Ouk; Nealey, PF, MICROELECTRONIC ENGINEERING, v.67-8, pp.56 - 62, 2003-06 |
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