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Dry etching characteristics of Pb(ZrTi)O-3 films in CF4 and Cl-2/CF4 inductively coupled plasmas Jung, JK; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.40, no.3A, pp.1408 - 1419, 2001-03 |
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