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Electromigration model for the prediction of lifetime based on the failure unit statistics in aluminum metallization Park, JH; Ahn, Byung Tae, JOURNAL OF APPLIED PHYSICS, v.93, no.2, pp.883 - 892, 2003-01 |
Time-zero failure current measurement for early monitoring of defective metal lines at wafer level Park, JH; Ahn, Byung Tae, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.150, no.1, pp.6 - 9, 2003-01 |
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