Showing results 1 to 2 of 2
Metallorganic chemical vapor deposition of metallic Ru thin films on biaxially textured Ni substrates using a Ru(EtCp)(2) precursor Tian, HY; Chan, HLW; Choy, CL; Choi, JW; No, Kwangsoo, MATERIALS CHEMISTRY AND PHYSICS, v.93, pp.142 - 148, 2005-09 |
Structural and electrical characteristics of highly textured oxidation-free Ru thin films by DC magnetron sputtering Tian, HY; Wang, Y; Chan, HLW; Choy, CL; No, Kwangsoo, JOURNAL OF ALLOYS AND COMPOUNDS, v.392, pp.231 - 236, 2005-04 |
Discover