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Effects of inductively coupled plasma oxidation on the properties of polycrystalline silicon films and thin film transistors Choi, YW; Park, SW; Ahn, Byung Tae, APPLIED PHYSICS LETTERS, v.74, no.18, pp.2693 - 2695, 1999-05 |
Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition Hur, M; Kim, DJ; Kang, WS; Lee, JO; Song, YH; Kim, Sang-Joon; Kim, Il-Doo, PLASMA CHEMISTRY AND PLASMA PROCESSING, v.36, no.2, pp.679 - 691, 2016-03 |
The Effect of Anisotropic Conductive Films Adhesion on the Bending Reliability of Chip-in-Flex Packages for Wearable Electronics Applications Kim, Ji-Hye; Lee, Tae-Ik; Kim, Taek-Soo; Paik, Kyung-Wook, IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY, v.7, no.10, pp.1583 - 1591, 2017-10 |
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