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Formation of TiO2 thin films using NH3 as catalyst by metalorganic chemical vapor deposition Jung, Sung-Hoon; Kang, Sang-Won, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1, v.40, no.5A, pp.3147 - 3152, 2001-05 |
Low-resistivity ruthenium metal thin films grown via atomic layer deposition using dicarbonyl-bis(5-methyl-2,4-hexanediketonato)ruthenium (II) and oxygen Ko, Eun Chong; Kim, Jae Yeon; Rhee, Hakseung; Kim, Kyung Min; Han, Jeong Hwan, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v.156, 2023-03 |
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