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Showing results 1 to 7 of 7

1
Hierarchical self-assembly of block copolymers for lithography-free nanopatterning

Kim, Bong-Hoon; Shin, Dong-Ok; Jeong, Seong-Jun; Koo, Chong-Min; Jeon, Sang-Chul; Hwang, Wook-Jung; Lee, Su-Mi; et al, ADVANCED MATERIALS, v.20, no.12, pp.2303 - 2303, 2008-06

2
Large-area, highly oriented lamellar block copolymer nanopatterning directed by graphoepitaxially assembled cylinder nanopatterns

Moon, Hyoung-Seok; Shin, Dong-Ok; Kim, Bong-Hoon; Jin, Hyeong-Min; Lee, Su-Mi; Lee, Moon-Gyu; Kim, Sang-Ouk, JOURNAL OF MATERIALS CHEMISTRY, v.22, no.13, pp.6307 - 6310, 2012-04

3
One-Dimensional Nanoassembly of Block Copolymers Tailored by Chemically Patterned Surfaces

Shin, Dong-Ok; Kim, Bong-Hoon; Kang, Ju-Hyung; Jeong, Seong-Jun; Park, Seung-Hak; Lee, Yong-Hee; Kim, Sang-Ouk, MACROMOLECULES, v.42, no.4, pp.1189 - 1193, 2009-02

4
Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement

Jeong, Seong-Jun; Kim, Ji-Eun; Moon, Hyoung-Seok; Kim, Bong-Hoon; Kim, Su-Min; Kim, Jin-Baek; Kim, Sang-Ouk, NANO LETTERS, v.9, no.6, pp.2300 - 2305, 2009-06

5
Spin Cast PDMS Film Supported Versatile and Transferrable Block Copolymer Lithography

Park, Seok Han; Yun, JeMoon; Moon, Hyoung-Seok; Kim, Sang-Ouk, SCIENCE OF ADVANCED MATERIALS, v.7, no.5, pp.886 - 890, 2015-05

6
Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography

Kim, Bong-Hoon; Kim, Ju-Young; Jeong, Seong-Jun; Hwang, Jin-Ok; Lee, Duck-Hyun; Shin, Dong-Ok; Choi, Sung-Yool; et al, ACS NANO, v.4, no.9, pp.5464 - 5470, 2010-09

7
Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning

Jeong, Seong-Jun; Moon, Hyoung-Seok; Kim, Bong-Hoon; Kim, Ju-Young; Yu, Jae-Ho; Lee, Su-Mi; Lee, Moon-Gyu; et al, ACS NANO, v.4, no.9, pp.5181 - 5186, 2010-09

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