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A study on the crystallographic orientation with residual stress and electrical property of Al films deposited by sputtering Kim, SP; Choi, HM; Choi, Si-Kyung, THIN SOLID FILMS, v.322, no.1-2, pp.298 - 302, 1998-06 |
Analysis and modeling of residual stress in diamond thin film deposited by the hot-filament chemical vapor deposition process Cha, SI; Hong, Soon-Hyung, JOURNAL OF MATERIALS RESEARCH, v.16, no.7, pp.1953 - 1959, 2001-07 |
ORIGIN OF INTRINSIC STRESS IN Y2O3 FILMS DEPOSITED BY REACTIVE SPUTTERING CHOI, HM; Choi, Si-Kyung, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.13, no.6, pp.2832 - 2835, 1995-11 |
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