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Showing results 1 to 10 of 10

1
Concurrent Optimization of Diffraction Fields from Binary Phase Mask for Three-Dimensional Nanopatterning

Lee, Chihun; Chang, Gunho; Kim, Jaekyung; Hyun, Gayea; Bae, Gwangmin; So, Sunae; Yun, Jooyeong; et al, ACS PHOTONICS, v.10, no.4, pp.919 - 927, 2023-04

2
Determination of piezoelectric coefficients of ferroelectric thin films using GaAs : Cr adaptive interferometer

Spirin, VV; Sokolov, IA; No, Kwangsoo, OPTICS AND LASER TECHNOLOGY, v.36, no.4, pp.337 - 340, 2004-06

3
Determination of the linear electrooptic coefficient of a lead zirconate titanate thin film using two-beam polarization interferometer with an adaptive photodetector

Spirin, VV; Lee, C; No, Kwangsoo; Sokolov, IA, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.37, no.5A, pp.519 - 521, 1998-05

4
Deterministic Nanotexturing by Directional Photofluidization Lithography

Lee, Seung-Woo; Shin, Jong-Hwa; Kang, Hong-Suk; Lee, Yong-Hee; Park, Jung-Ki, ADVANCED MATERIALS, v.23, no.29, pp.3244 - 3250, 2011-08

5
High photosensitive sol-gel hybrid materials for direct photo-imprinting of micro-optics

Bae, Byeong-Soo, JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, v.31, no.1-3, pp.309 - 315, 2004-08

6
Highly angle-sensitive and efficient optical metasurfaces with broken mirror symmetry

Kim, Nayoung; Kim, Myungjoon; Jung, Joonkyo; Chang, Taeyong; Jeon, Suwan; Shin, Jonghwa, NANOPHOTONICS, v.12, no.13, pp.2347 - 2358, 2023-06

7
Optical filters fabricated in hybrimer media with soft lithography

Lee, Kyu J.; Jin, Jung-Ho; Bae, Byeong-Soo; Magnusson, Robert, OPTICS LETTERS, v.34, no.16, pp.2510 - 2512, 2009-08

8
Rapid and Large-Scale Fabrication of Full Color Woodpile Photonic Crystals via Interference from a Conformal Multilevel Phase Mask

Nam, Sang Hyeon; Park, Junyong; Jeon, Seokwoo, ADVANCED FUNCTIONAL MATERIALS, v.29, no.44, pp.1904971, 2019-11

9
Soft Elastomeric Nanopillar Stamps for Enhancing Absorption in Organic Thin-Film Solar Cells

Hyun, Jerome K.; Ahn, Changui; Kang, Hyunbum; Kim, Hyeong Jun; Park, Junyong; Kim, Ki-Hyun; Ahn, Chi Won; et al, SMALL, v.9, no.3, pp.369 - 374, 2013-02

10
Sub-50 nm period patterns with EUV interference lithography

Solak, HH; David, C; Gobrecht, J; Golovkina, V; Cerrina, F; Kim, Sang Ouk; Nealey, PF, MICROELECTRONIC ENGINEERING, v.67-8, pp.56 - 62, 2003-06

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