Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Subject Ferroelectric▼aZr doped hafnium oxide ($Hf_{0.5}Zr_{0.5}O_2$)▼aAtomic layer deposition (ALD)▼aHydrogen peroxide ($H_2O_2$)▼aO2 plasma
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| 과산화수소 산화제 기반 원자층 증착을 이용한 $Hf_{0.5}Zr_{0.5}O_2$ 강유전체 박막 제조 = Fabrication of ㄹerroelectric $Hf_{0.5}Zr_{0.5}O_2$ Thin Film by Atomic Layer Deposition (ALD) using $H_2O_2$ Oxidantlink Kim, Hyoung Kyu; Hong, Seungbum; et al, 한국과학기술원, 2020 |
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