Showing results 1 to 4 of 4
Deposition characteristics of low dielectric constant SiOF films prepared by ECR PECVD Byun, KM; Lee, Won-Jong, METALS AND MATERIALS-KOREA, v.6, no.2, pp.155 - 160, 2000-04 |
RF magnetron sputtering 증착공정에서 플라즈마 특성과 비정질 $CN_x$ 박막성질의 상관관계에 관한 연구 = A study on the correlation between the plasma and amorphous $CN_x$ film characteristics using RF magnetron sputteringlink 노기민; Roh, Ki-Min; et al, 한국과학기술원, 2011 |
Surface structure and field emission property of carbon nanotubes grown by radio-frequency plasma-enhanced chemical vapor deposition Jung, Yeon Sik; Jeon, DukYoung, APPLIED SURFACE SCIENCE, v.193, no.1-4, pp.129 - 137, 2002-06 |
Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH4, SiF4 and O-2 Byun, KM; Lee, Won-Jong, THIN SOLID FILMS, v.376, no.1-2, pp.26 - 31, 2000-11 |
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