Showing results 1 to 6 of 6
Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition Ryu, Ho Jin; Kim, SH; Hong, Soon-Hyung, MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, v.277, no.1-2, pp.57 - 63, 2000-01 |
Effect of Gas Composition on TiN Thin-Film Fabrication in N2/H2/Ar/TiCl4 Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition System Jang, SS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS, v.40, no.8, pp.4819 - 4824, 2001-08 |
Multi-scale simulation of plasma generation and film deposition in a circular type DC magnetron sputtering system Kwon, UH; Choi, SH; Park, YH; Lee, Won-Jong, THIN SOLID FILMS, v.475, no.1-2, pp.17 - 23, 2005-03 |
Multiscale Monte Carlo simulation of circular DC magnetron sputtering: Influence of magnetron design on target erosion and film deposition Kwon, Ui Hui; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS, v.45, no.11, pp.8629 - 8638, 2006-11 |
Simulation Study on the Etching Mechanism of the Bosch Process Kim, Chang-Gyu; Moon, Jae-Seung; Lee, Won-Jong, KOREAN JOURNAL OF METALS AND MATERIALS, v.49, no.10, pp.797 - 804, 2011-10 |
Sulfur-impregnated MWCNT microball cathode for Li-S batteries Choi, Jin-Hoon; Lee, Cho Long; Park, Kyu-Sung; Jo, Sung-Moo; Lim, Dae-Soon; Kim, Il-Doo, RSC ADVANCES, v.4, no.31, pp.16062 - 16066, 2014-03 |
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