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Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition Hur, M; Kim, DJ; Kang, WS; Lee, JO; Song, YH; Kim, Sang-Joon; Kim, Il-Doo, PLASMA CHEMISTRY AND PLASMA PROCESSING, v.36, no.2, pp.679 - 691, 2016-03 |
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