Showing results 1 to 1 of 1
The effects of the addition of CF4, Cl2 and N2 to oxygen ECR plasma on the etch rates, selectivities, and etched profiles of RuO2 films Lee, Won-Jong; LEE, EJ; Kim, JS; Kim, JW; Baik, KH, Proceedings of the Materials Research Society Symposium, pp.183 - 188, 1997-01-01 |
Discover