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EFFECTS OF ANNEALING IN O-2 AND N-2 ON THE ELECTRICAL-PROPERTIES OF TANTALUM OXIDE THIN-FILMS PREPARED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION Kim, IL; Kim, Jong-Seok; Kwon, Oh-Seung; Ahn, Sung-Tae; Chun , Soung Soon; Lee, Won-Jong, JOURNAL OF ELECTRONIC MATERIALS, v.24, no.10, pp.1435 - 1441, 1995-10 |
열처리 조건이 ECR plasma 화학 증착법으로 증착된 tantalum oxide 박막의 물성에 미치는 영향 = The effects of annealing conditions on the properties of tantalum oxide thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor depositionlink 권오승; Kwon, Oh-Seung; et al, 한국과학기술원, 1993 |
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